Physical Vapour Deposition and Characterisation Facility

The Physical Vapour Deposition and Characterisation Facility was launched in 2023 and is available on open access to all commercial and academic researchers.

For an overview of this state-of-the-art facility watch the Royce Cambridge PVDCF Video

This facility includes an AJA sputtering system, custom sputtering systems, an electron beam evaporator, an argon ion miller, an atomic force microscope, an Electron-beam lithography system and a cryogenic DC/RF probe station    

An overview of the facility is available in this leaflet with detailed information available at the Centre for Materials Physics.

If your research interests require the use of the Physical Vapour Deposition and Characterisation Facility, please contact Facility Manager Nadia Stelmashenko (nas19@cam.ac.uk).