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Sputter Deposition and Nanoscale Patterning Suite

The sputter deposition/nanoscale patterning suite consists of an AJA sputter deposition system for the automated growth of metallic heterostructures for devices and a Zeiss Cross-beam 540 focused ion beam/electron beam system (FIB-SEM) for in-situ patterning and device fabrication.  It can operate in association with the sputtering MBE capability of the Royce PVD suite.

The sputtering system has a load-lock and is configured with eleven targets, internal calibration and automated processes for the growth of complex metallic heterostructures for devices. This will provide a unique capability for 3D heterostructure fabrication which can generate novel magnetic and optical materials systems. The dual beam FIB-SEM system uses a range of ion sources including a Ga ion beam to enable direct patterning of micro- and nano-pillar devices, and offers an alternative to the standard subtractive etch process used in optical lithography. This system can produce smaller devices without breaking vacuum, and without forming ex-situ interfaces. As a combined suite, these two systems offer the capability for 3D heterostructure device fabrication for magnetic and optical materials systems.

If your research interests require characterisation of your materials or devices using Physical Vapour Deposition (PVD), the pattening and growth of metallic structures for devices, or you would like to discuss opportunities for such characterisation please contact Dr Jason Robinson ( jjr33@cam.ac.uk ) or Dr Nadia Stelmashenko ( nas19@cam.ac.uk ) in the Department of Materials Science and Metallurgy.