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Sputter Deposition and Nanoscale Patterning Suite

The Royce Physical Deposition and Materials Characterisation Facility consists of 8 UHV sputter deposition systems, two pulsed laser deposition chambers and a UHV electron beam evaporator for the automated growth of metallic and oxide heterostructures for devices and a Zeiss Cross-beam 540 focused ion beam/electron beam system (FIB-SEM) for in-situ patterning and device fabrication.  It can operate in association with the sputtering MBE capability of the Royce PVD suite. Several of the sputtering chambers include load-lock entry for rapid materials growth and the AJA system is configured with eleven targets, internal calibration and automated processes for the growth of complex metallic or insulating heterostructures for devices. This facility provides a unique capability for 3D heterostructure fabrication which can generate novel magnetic and optical materials systems.

The dual beam FIB-SEM system uses a range of ion sources including a Ga ion beam to enable direct patterning of micro- and nano-pillar devices, and offers an alternative to the standard subtractive etch process used in optical lithography. This system can produce smaller devices without breaking vacuum, and without forming ex-situ interfaces. As a combined suite, the sputtering and FIB systems offer the capability for 3D heterostructure device fabrication for magnetic and optical materials systems.

If your research interests require characterisation of your materials or devices using Physical Vapour Deposition (PVD), the pattening and growth of metallic structures for devices, or you would like to discuss opportunities for such characterisation please contact Dr Jason Robinson ( ) or Dr Nadia Stelmashenko ( ) in the Department of Materials Science and Metallurgy.