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An existing ultrahigh-vacuum photoemission instrument, an Escalab 250Xi, will be run alongside the near ambient pressure (NAP) X-ray photoemission spectroscopy (XPS) system as a combined joint facility.

The current instrument has the following complementary capabilities:

• X-ray photoemission spectroscopy (XPS) for chemical analysis of surfaces under inert, UHV conditions

• Ultra-violet photoemission spectroscopy (UPS) for measurements of valence bands and work functions with a 21.2eV excitation source

• Angle resolved x-ray photoemission spectroscopy (ARXPS) by varying the angle that the sample is held at and in this way varying the analysis depth down to a few nanometers. This is a non-destructive technique.

• Depth profiling x-ray photoemission spectroscopy (DPXPS) which combines a sequence of argon ion gun etch cycles with XPS analysis. This is a destructive technique.

The combined XPS system will be operational in mid 2018.

If your research interests require access to this XPS system and have any questions on the tool’s capabilities please contact Professor Henning Sirringhaus