An existing ultrahigh-vacuum photoemission instrument, an Escalab 250Xi, will be run alongside the near ambient pressure (NAP) X-ray photoemission spectroscopy (XPS) system as a combined joint facility.
The current instrument has the following complementary capabilities:
• X-ray photoemission spectroscopy (XPS) for chemical analysis of surfaces under inert, UHV conditions
• Ultra-violet photoemission spectroscopy (UPS) for measurements of valence bands and work functions with a 21.2eV excitation source
• Angle resolved x-ray photoemission spectroscopy (ARXPS) by varying the angle that the sample is held at and in this way varying the analysis depth down to a few nanometers. This is a non-destructive technique.
• Depth profiling x-ray photoemission spectroscopy (DPXPS) which combines a sequence of argon ion gun etch cycles with XPS analysis. This is a destructive technique.
If your research interests require access to this XPS system and have any questions on the tool’s capabilities please email the academic lead Professor Henning Sirringhaus (hs220@cam.ac.uk) or the technical contact Dr Shaoliang Guan ( sg2156@cam.ac.uk ) in the Department of Physics.