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UHV UPS ARXRS DPXPS X-ray Photoemission Spectroscopy

An existing ultrahigh-vacuum photoemission instrument, an Escalab 250Xi, will be run alongside the near ambient pressure (NAP) X-ray photoemission spectroscopy (XPS) system as a combined joint facility.

The current instrument has the following complementary capabilities:

• X-ray photoemission spectroscopy (XPS) for chemical analysis of surfaces under inert, UHV conditions

• Ultra-violet photoemission spectroscopy (UPS) for measurements of valence bands and work functions with a 21.2eV excitation source

• Angle resolved x-ray photoemission spectroscopy (ARXPS) by varying the angle that the sample is held at and in this way varying the analysis depth down to a few nanometers. This is a non-destructive technique.

• Depth profiling x-ray photoemission spectroscopy (DPXPS) which combines a sequence of argon ion gun etch cycles with XPS analysis. This is a destructive technique.

If your research interests require access to this XPS system and have any questions on the tool’s capabilities please email the academic lead Professor Henning Sirringhaus ( or the technical contact Dr Shaoliang Guan ( ) in the Department of Physics.